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Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by esperent on Saturday July 29, 2023 @09:09PM (#36926631)
> EUV necessitates an entirely new way to generate light. It’s a remarkably complex process that involves hitting molten tin droplets in midflight with a powerful CO2 laser. The laser vaporizes the tin into a plasma, emitting a spectrum of photonic energy. From this spectrum, the EUV optics harvest the required 13.5-nm wavelength and direct it through a series of mirrors before it is reflected off a patterned mask to project that pattern onto the wafer

This is incredible and feels like the most sci-fi sentence I've read in a long time.

It's unbelievable to think that this works, not just in a lab, but in commercial systems that will produce hundreds of chip wafers an hour (>100 anyway, they didn't clarify further).

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by sbierwagen on Saturday July 29, 2023 @09:28PM (#36926775)
It's also terribly inefficient. EUV "mirrors" eat 30% of the incoming light. Since they have such a narrow reflective range and the source light isn't collimated or coherent, you have to use a bunch of them. By the time you're at the mask, you've lost 96% of the light. As a result:

>Hynix reported at the 2009 EUV Symposium that the wall plug efficiency was ~0.02% for EUV, i.e., to get 200-watts at intermediate focus for 100 wafers-per-hour, one would require 1-megawatt of input power

https://en.wikipedia.org/wiki/Extreme_ultraviolet_lithograph...

It's an damn good question of how much further this can scale. EUV photons are a lot more like x-rays than they are visible light. They're energetic enough now they're inflicting ionization effects on mask material, blurring the exposed area with secondary electron scatter. The fundamental limit of electronic transistors, ones made out of single molecules, are going to be tough to make with lithography.

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by _hypx on Saturday July 29, 2023 @09:34PM (#36926808)
The final challenge will be cost: With every iteration, costs increase dramatically. At some point, it simply ceases to make sense to scale down transistors any further.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by throwawaylinux on Sunday July 30, 2023 @12:27AM (#36927798)
Cost has been the challenge for the past 30-40 years at least.

Many semiconductor manufacturers have folded, dropped out, or merged over the years due to costs putting development of the next node out of their reach. If the remaining 3 drop out of the race, they will be following the same pattern as many before.

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by wtallis on Sunday July 30, 2023 @01:03AM (#36927988)
R&D and tooling costs have grown enormously to bring new fab process nodes online, but the actual per-wafer costs of materials and operating expenses historically haven't been growing to the same alarming degree. But that's changing, as new nodes are increasingly relying on power-hungry tools with low throughput that wear out mask sets at an unprecedented rate. It's not implausible for the industry to reach a point where new leading-edge processes will never mature to the point that they make economic sense for the low-cost applications that currently stay a few nodes behind the leading edge.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by viscanti on Sunday July 30, 2023 @09:17AM (#36930881)
The problem here would be that if mask sets wear out at an unprecedented rate, it might not make sense to use these cutting edge nodes in the future (if/when we're several nodes ahead by then) for the things that currently use older nodes. Maybe Moore's law is dead for the types of things that stay 2 or 3 nodes behind state of the art all the time.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by cubefox on Sunday July 30, 2023 @04:48AM (#36929215)
That was because of competition. The cost per transistor actually went down by a lot. If it soon goes up significantly, it will stop to make economic sense to increase transistor density any further. Why pay the same amount of money for a less powerful chip?

Maybe it will make sense for mobile SoCs or some other energy constrained applications which benefit from lower power draw of smaller process node chips. But power efficiency can outweigh lower absolute performance only to some degree.

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by throwawaylinux on Sunday July 30, 2023 @05:10AM (#36929325)
> That was because of competition. The cost per transistor actually went down by a lot.

I'm not talking about the marginal cost to make the device, I'm talking about the R&D and capital expenditure to develop and build the machines for the next node.

You can be reductive and say it always boils down to competition, but then you would also say that ultimately shrinking will end when it can no longer compete with mature nodes. Competition in both cases. So I'm not sure what exactly that's getting at.

> If it soon goes up significantly, it will stop to make economic sense to increase transistor density any further. Why pay the same amount of money for a less powerful chip?

That's not strictly true, performance of a transistor still has value. Companies like Apple pay premiums to get in early on leading edge nodes, more per device than the mature nodes they move from.

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by cubefox on Sunday July 30, 2023 @05:33AM (#36929440)
Competition with "mature nodes" is different in the sense that here one company (like TSMC) will be "competing" with itself. They will just stop building next gen fabs if their chips wouldn't sell.

> That's not strictly true, performance of a transistor still has value. Companies like Apple pay premiums to get in early on leading edge nodes, more per device than the mature nodes they move from.

Apple can't increase the price of their product arbitrarily. So if the price per performance increases, the new iPhone would be slower than the old one. Maybe people will still buy it if it has better power efficiency, but that is a trade-off which has its limits.

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by mschuster91 on Sunday July 30, 2023 @06:03AM (#36929593)
> Apple can't increase the price of their product arbitrarily.

Not arbitrarily, but IIRC Apple's profit margin on iPhones is over 100% - the iPhone 14 Pro max is supposed to have a BoM cost of ~470 $ and retails for well over 1000$. That means Apple can both afford the high upfront premium/R&D cost of going to a smaller node and to eat up higher SoC costs and yet still have a profit per unit that would lead most other companies' CFOs to drool.

On top of that, even if the economics should not work out for mobile... a fully spec'd out M2 Ultra Mac Pro runs at ~14.000$, Intel ones IIRC could reach 50.000$. The crowd that pays such absurd prices has zero problems paying a grand or two more for higher performance.

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by throwawaylinux on Sunday July 30, 2023 @06:32AM (#36929758)
> Competition with "mature nodes" is different in the sense that here one company (like TSMC) will be "competing" with itself.

No, why? Lots of foundries out there that don't compete on leading edge nodes.

> Apple can't increase the price of their product arbitrarily. So if the price per performance increases, the new iPhone would be slower than the old one. Maybe people will still buy it if it has better power efficiency, but that is a trade-off which has its limits.

That doesn't address what I said -- that price per transistor is not the single limiting factor. I never said any performance increase is worth infinite value.

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by cubefox on Sunday July 30, 2023 @06:49AM (#36929838)
> No, why? Lots of foundries out there that don't compete on leading edge nodes

The discussion was about Moore's law ("scaling down"), which is only about the leading edge.

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by throwawaylinux on Sunday July 30, 2023 @06:57AM (#36929893)
The discussion moved to talking about is competing with mature nodes, where you said they'd only be competing with themselves (which doesn't seem to be right).
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by cubefox on Sunday July 30, 2023 @07:26AM (#36930055)
Well, it's right for the leading edge. The point is that they will stop scaling chips before technical limits are reached.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by throwawaylinux on Sunday July 30, 2023 @07:50AM (#36930218)
> Well, it's right for the leading edge.

No, the point was that the leading edge will stop advancing when it can no longer compete economically with companies that sell mature nodes. Which is obvious, but I was just being similarly reductive.

> The point is that they will stop scaling chips before technical limits are reached.

Sure, like most commercial ventures, cost becomes prohibitive at some point and overtakes benefits. As it always has been.

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by cubefox on Sunday July 30, 2023 @01:38PM (#36933776)
> No, the point was that the leading edge will stop advancing when it can no longer compete economically with companies that sell mature nodes.

The "mature node" here will just be the one before the first node that doesn't make economic sense anymore. And this will be from a leading edge company, most likely TSMC. Say, if 2nm is too expensive compared to 3nm, then TSMC will stick with 3nm.

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by throwawaylinux on Sunday July 30, 2023 @09:34PM (#36937916)
Yep.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by tlb on Saturday July 29, 2023 @09:44PM (#36926881)
Still, 1 MWh is a tiny fraction of the power those 100 wafers worth of chips will consume in their lifetime. So if we can reduce power consumption with smaller features, it's worth using more laser power.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by fnordpiglet on Saturday July 29, 2023 @11:37PM (#36927581)
I’d note that quote is 14 years old - hopefully there’s been some R&D over that time!
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by throwawaylinux on Sunday July 30, 2023 @12:41AM (#36927865)
Still, ASML's latest EUV machine, the 3600D, does draw 1.3 megawatts.

https://www.sec.gov/Archives/edgar/data/937966/0000937966220...

But when it comes to cost, evidently replacing many passes and other complicated processes with DUV machines with fewer EUV passes is a net win. And the energy required to create these chips must be a small fraction of the energy they will use in their lifetimes, so improved efficiency of the smaller nodes enabled by EUV would surely be a win, all else being equal.

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by ben_w on Sunday July 30, 2023 @04:43AM (#36929183)
That makes me wonder (as someone who has merely heard of the two technologies and knows nothing much about either beyond the Wikipedia page) why it's not using a free electron laser?

Aren't those tuneable to any wavelength down to X-rays?

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by namibj on Sunday July 30, 2023 @06:09AM (#36929627)
Global foundries banked on that, and a Japanese laboratory is building/running a demonstrator.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by amelius on Sunday July 30, 2023 @07:36AM (#36930119)
Isn't that similar to synchrotron x-rays? I just watched a video where they say that that's what people started with before they got to the tin plasma method.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by kleton on Sunday July 30, 2023 @07:55AM (#36930250)
It is somewhat likely that effective free electron laser is locked up behind the invention secrecy act of 1951 as a critical DOD tech.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by LargoLasskhyfv on Sunday July 30, 2023 @02:58PM (#36934699)
Is it? And what is "effective? Tabletop? Deskside? Or this: https://www.xfel.eu/ ?
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by ben_w on Sunday July 30, 2023 @03:30PM (#36935024)
XFEL is

> Wavelength 0.05 to 4.7 nanometres

- https://www.xfel.eu/facility/overview/facts_amp_figures/inde...

which is sufficient and possibly excessive.

Not that I know anything about any of the other considerations in such things. Is 3.4 km "too big"? Is €1.22 bn "too expensive"?

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by amluto on Sunday July 30, 2023 @09:51AM (#36931150)
Here’s a paper on some research in this direction:

https://iopscience.iop.org/article/10.35848/1347-4065/acc18c

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by civilitty on Sunday July 30, 2023 @09:54AM (#36931170)
That's called electron-beam lithography:

> This form of maskless lithography has high resolution but low throughput, limiting its usage to photomask fabrication, low-volume production of semiconductor devices, and research and development. [1]

The beam has to scan across the entire wafer instead of exposing it all at once, so it's extremely slow and uneconomical for mass production.

[1] https://en.wikipedia.org/wiki/Electron-beam_lithography

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by ben_w on Sunday July 30, 2023 @10:34AM (#36931534)
I'm fairly sure they're two different things: e-beam (as per your link) does the reaction with the electrons themselves, whereas FEL uses an electron beam as a lasing medium.

https://en.wikipedia.org/wiki/Free-electron_laser

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by XorNot on Sunday July 30, 2023 @10:20AM (#36931392)
It's worth noting that necessity has tendency to make this possible though: the original CD laser diodes required extreme equipment investment to mass produce.

You could conceive of making the speed up in parallel production.

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by LargoLasskhyfv on Sunday July 30, 2023 @03:01PM (#36934718)
Or use an 8x8 array of them and have 64bits...err...beams at the same time.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by ben_w on Sunday July 30, 2023 @05:38PM (#36936266)
IIRC you can't usefully do that, because the limit is from the combined electric field of the electrons in the beam(s) causing blurriness — more beams at fixed current per beam means more blur.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by LargoLasskhyfv on Monday July 31, 2023 @09:28AM (#36942167)
Treat it like a phased array, with hypermegamodulation by realtime machine learning artificial fuzzy logic, canceling out any blurriness in advance, producing the finest and sharpest turbonanoscalpels, able to etch any sketch, fast. Built to last!

F... yeah!

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by winternewt on Sunday July 30, 2023 @05:23AM (#36929383)
I wonder what the possibilities for a fundamentally different manufacture method are. For example, what if we could program a layout into DNA and have biological agents construct it?
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by RetroTechie on Sunday July 30, 2023 @06:53AM (#36929857)
Well, unless one devises a way to break up atoms + rearrange those in such a way as to turn protons, neutrons, quarks etc. into compute machinery, we're stuck with individual atoms (or small groups of those) as the smallest possible building blocks. And thus Moore's law will hit a brick wall at some point. 3D structures (stacks w/ many layers of transistors & interconnect) will help, but make thermal issues more difficult than they already are.

Kind of like (iirc) the tip of a scanning tunneling microscope might be used to pick up & manipulate individual atoms.

Self-organizing materials like DNA might make that process easier, not scale it down further.

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by ansible on Sunday July 30, 2023 @07:37AM (#36930121)
Read up on Molecular Nanotechnology.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by winternewt on Monday August 07, 2023 @09:10AM (#37033945)
Perhaps the thermal issues could be solved with LK99 :)
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by HPsquared on Sunday July 30, 2023 @06:47PM (#36936779)
In other words, 10 kWh per wafer - a couple of dollars per wafer in energy costs.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by rsweeney21 on Saturday July 29, 2023 @09:46PM (#36926900)
Came here to make the exact same comment. I can't help but feel like some day we will forget how we were able to make such amazing machines.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by Agathos on Saturday July 29, 2023 @09:52PM (#36926941)
Two must watch videos about the whole process:

https://youtu.be/5Ge2RcvDlgw

https://youtu.be/pfU20SAR21A

(Typed on a device made by this process, which I still don’t quite believe.)

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by NortySpock on Saturday July 29, 2023 @10:00PM (#36926997)
Twice. They have to hit the molten droplet twice.

Once "gently" to deform it briefly into a concave shape, and the second, harder pulse to actually activate the droplet to emit extreme ultraviolet light

Asianometry on EUV. Skip to 10m50s. https://youtu.be/5Ge2RcvDlgw

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by fnordpiglet on Sunday July 30, 2023 @12:42AM (#36927877)
Anyone who reads these descriptions and doesn’t realize this is literally the magic of sorcerers predicted in our fantasy lore have lost the ability to dream. What an amazing time to be alive.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by dougmwne on Sunday July 30, 2023 @03:26AM (#36928725)
The process sure, but the end product? Sand awoken, talking, thinking, creating, dreaming. Merlin was not so powerful.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by AshamedCaptain on Sunday July 30, 2023 @05:44AM (#36929498)
I'm quite sure that the people working on this see lots and lots of barely holding duct tape in what you describe as "magic".
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by ThrowawayTestr on Sunday July 30, 2023 @06:25AM (#36929721)
And yet that duct-taped machine can consistently fire two laser beams at a single droplet of molten tin hundreds of times an hour. Pretty magic if you ask me.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by fnordpiglet on Sunday July 30, 2023 @08:17AM (#36930411)
I teach my daughter science is just magic we understand. Once we understand something it becomes ordinary, but the trick is to hold onto the wonder.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by jacquesm on Sunday July 30, 2023 @09:43AM (#36931075)
I'm quite sure they know the difference between real engineering and pretend engineering and I can guarantee you there is no duct tape in there, each and every last residual effect is part of the model, if it weren't it wouldn't work at all. The scales you're talking about imply that even the tiniest parasitic effect that you could safely ignore otherwise is going to utterly dominate your work if you don't account for it.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by szundi on Sunday July 30, 2023 @02:00AM (#36928304)
For everyone to understand: pew pew, not just pew
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by zeristor on Sunday July 30, 2023 @05:32AM (#36929438)
Just so long as Stormtroopers aren’t doing the aiming.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by audunw on Sunday July 30, 2023 @04:43AM (#36929181)
Asianometry is an amazing channel for topic like this. Also check the video on water for chip manufacturing. You’d never think there so many interesting challenges with something so mundane as water.

Modern chip manufacturing is basically black magic.

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by Hikikomori on Sunday July 30, 2023 @06:36AM (#36929774)
Basically the title of this presentation. https://youtu.be/NGFhc8R_uO4
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by jacquesm on Sunday July 30, 2023 @09:41AM (#36931060)
Highly recommended if you haven't seen it yet.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by automatic6131 on Sunday July 30, 2023 @06:49AM (#36929837)
>Modern chip manufacturing is basically black magic.

This, if you ever want to feel wonder at things the human race can accomplish, lithography has to be in the top 3 reasons imo.

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by Cyph0n on Sunday July 30, 2023 @04:47AM (#36929203)
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by NortySpock on Tuesday August 01, 2023 @08:40AM (#36955221)
Thank you, I was on mobile and couldn't easily find the timestamped url option.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by fennecfoxy on Tuesday August 01, 2023 @09:33AM (#36955755)
Not only do they hit it twice, but they're also depositing and hitting it twice _50,000_ times every second!

https://www.asml.com/en/technology/lithography-principles/li....

Just absolutely insane engineering going on there.

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by nntwozz on Saturday July 29, 2023 @10:03PM (#36927017)
If you like that and want to know more Asianometry did a deep dive on this process:

https://youtu.be/5Ge2RcvDlgw

A short video showing the laser in action:

https://youtu.be/NHSR6AHNiDs

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by ksec on Sunday July 30, 2023 @12:08AM (#36927715)
>This is incredible and feels like the most sci-fi sentence I've read in a long time.

And that is sad part of so called "Tech" today. Zero appreciation of it outside of the minorities.

They are doing is on a massive scale, extreme precision, high cost of electricity, insane difficulty in both designing chips and production.

And yet HN thinks all the hardware chips today are over priced and absurdly expensive.

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by incompatible on Sunday July 30, 2023 @01:59AM (#36928301)
It's a bit worse than "zero appreciation" in some cases, it's people using the results from hundreds of years of advances in science and engineering to proudly post their anti-scientific viewpoints.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by abwizz on Sunday July 30, 2023 @03:39AM (#36928794)
rather common thou, as it should be.

i.e. there absolutely cannot be any obligation to subscribe to the ideology of either team eddison or team westinghouse in order to make use of a light switch.

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by machina_ex_deus on Sunday July 30, 2023 @06:55AM (#36929876)
Or maybe it's people confusing engineering (like this process) and science, and some research disciples trying to get an aura of validity from being labelled "science".

Climate change isn't science. It has such a weak predictive power compared to the number of tunable parameters, it fails predicting in short term, it barely succeeds in post-prediction (which isn't enough in any scientific field), and the consensus was reached by bullying competing viewpoints.

And then you have other scientists lying about the science of coronavirus origin to cover their guilty asses which were involved in gain of function research in the lab.

There were vaccines which were "tested" as 96% efficient in preventing infection which somehow, when deployed to the masses, the "science" shifts into 90% efficient in preventing death, then into complete uselessness.

You also have the replication crisis across social sciences or even the Alzheimer fraud recently.

The truly scientific person would notice his understanding is wrong, and that the science brand has been thoroughly abused and should no longer be a reliable indication of truthness.

And the religiously scientific person will keep on worshiping false prophets, because he doesn't understand that being wrong necessitates changing his understanding.

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by imtringued on Sunday July 30, 2023 @07:29AM (#36930075)
I'm sorry but CO2 being the primary driver of climate change was predicted in the 50s. Back then it was just a hypothesis and now it is undeniable.

Meanwhile the competition that was "bullied into submission" made ridiculous claims like global cooling all the way until 2014.

Inform yourself about a topic before talking about it.

Here is the ancient paper: https://onlinelibrary.wiley.com/doi/abs/10.1111/j.2153-3490....

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by machina_ex_deus on Sunday July 30, 2023 @09:46AM (#36931100)
If you think predicting a single number and doing it this badly (temperatures), 33% within the correct value, and calling it science, you're the problem.

Oh and nice cherry picking. With the given variable and its pretty small variance, I can cherry pick models too, and claim it is the rain god's judgement, or whatever.

The fact that IPCC's models currently barely even give a consistent prediction, and the variance between them is so high, shows this isn't science.

Everyone's attributing the signal in the models to CO2 or climate change, while the most reasonable explanation, is that the signal is a result of the agreed upon biases and approximations that everyone in "climate science" is copying from each other, and it is also clear that models that were developed independently give more diverging results, the Russian model even predicting cooling.

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by mitthrowaway2 on Sunday July 30, 2023 @03:15AM (#36928680)
HN will also happily exclude companies like ASML from their definition of a "tech" company, because most of their value doesn't come from their software IP.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by dreamcompiler on Sunday July 30, 2023 @08:58AM (#36930715)
Actually it does. ASML has one of the most sophisticated software shops in the world.

https://www.asml.com/en/technology/software

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by mitthrowaway2 on Sunday July 30, 2023 @12:40PM (#36933045)
"Actually it does", as in actually most of the company's value comes from their software IP?
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by throw0101a on Sunday July 30, 2023 @08:01AM (#36930305)
> And that is sad part of so called "Tech" today. Zero appreciation of it outside of the minorities.

This has always been true of technology.

Do you think most people cared about how a steam engine worked, or simply that it allowed them to go faster than a horse? Or the telegraph, radio, television, the internal combustion engine, etc.

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by jasonwatkinspdx on Sunday July 30, 2023 @01:35AM (#36928170)
Even more crazy that process runs at 50khz, that is vaporizing 50,000 droplets per second. This is necessary because the overall efficiency is really poor vs the energy density they need on the chip to react with resist.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by zeristor on Sunday July 30, 2023 @04:14AM (#36929019)
This raised all sorts of questions I was going to ask about the Physics, but I found this OpenAccess paper I’ll go through:

“Physics of laser-driven tin plasma sources of EUV radiation for nanolithography” (2019) https://iopscience.iop.org/article/10.1088/1361-6595/ab3302

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by zapkyeskrill on Sunday July 30, 2023 @05:53AM (#36929541)
In a moment of brain fart I imagined this process happening on the end device, us needing to /refuel/ the devices every now and then ...
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by arethuza on Sunday July 30, 2023 @06:32AM (#36929753)
There are some fascinating videos on YouTube from Zeiss, who do the optical systems for the ASML machines:

https://www.youtube.com/watch?v=z6c3vzIGo9o&t=632s

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by WeylandYutani on Sunday July 30, 2023 @06:45AM (#36929817)
Well it did take them 30 years to get working and lots of money.

That's why ASML doesn't have any competition: everyone else gave up.