ASML EUV Lithography Machine Could Keep Moore’s Law on Track

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by LargoLasskhyfv on Sunday July 30, 2023 @03:01PM (#36934718)

Or use an 8x8 array of them and have 64bits...err...beams at the same time.

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Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by ben_w on Sunday July 30, 2023 @05:38PM (#36936266)

IIRC you can't usefully do that, because the limit is from the combined electric field of the electrons in the beam(s) causing blurriness — more beams at fixed current per beam means more blur.

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Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by LargoLasskhyfv on Monday July 31, 2023 @09:28AM (#36942167)

Treat it like a phased array, with hypermegamodulation by realtime machine learning artificial fuzzy logic, canceling out any blurriness in advance, producing the finest and sharpest turbonanoscalpels, able to etch any sketch, fast. Built to last!

F... yeah!

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