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A comment on ASML EUV Lithography Machine Could Keep Moore’s Law on Track. Parent comment

Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by zeristor on Sunday July 30, 2023 @04:14AM (#36929019)
This raised all sorts of questions I was going to ask about the Physics, but I found this OpenAccess paper I’ll go through:

“Physics of laser-driven tin plasma sources of EUV radiation for nanolithography” (2019) https://iopscience.iop.org/article/10.1088/1361-6595/ab3302

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