Licensing:

> To address the challenge of EUV lithography, researchers at Lawrence Livermore National Laboratory, Lawrence Berkeley National Laboratory, and Sandia National Laboratories were funded in the 1990s to perform basic research into the technical obstacles. The results of this successful effort were disseminated via a public/private partnership Cooperative R&D Agreement (CRADA) with the invention and rights wholly owned by the US government, but licensed and distributed under approval by DOE and Congress.[8] The CRADA consisted of a consortium of private companies and the Labs, manifested as an entity called the Extreme Ultraviolet Limited Liability Company (EUV LLC).[9]

> Intel, Canon, and Nikon (leaders in the field at the time), as well as the Dutch company ASML and Silicon Valley Group (SVG) all sought licensing. Congress denied the Japanese companies the necessary permission as they were perceived as strong technical competitors at the time, and should not benefit from taxpayer-funded research at the expense of American companies.[10] In 2001 SVG was acquired by ASML, leaving ASML as the sole benefactor of the critical technology.[11]

[…]

> This made the once small company ASML the world leader in the production of scanners and monopolist in this cutting edge technology and resulted in a record turnover of 18.6 billion € in 2021, dwarfing their competitors Canon and Nikon who were denied IP access. […]

* https://en.wikipedia.org/wiki/Extreme_ultraviolet_lithograph...