ASML acquired SVGI (Silicon Valley Group, doesn't seem to have been created as a licensing vehicle, apparently founded in 1977), but according to wikipedia it already had access to the technology (SVGI, Intel, and some other US chip manufacturers had access to the tech).
Nowhere in any of the press articles about the acquisition they mention EUV as being a factor (seems like standard industry consolidation instead). If anything they were really far from delivering EUV at the time (it took close to 20y).
AMD produces their own x86 under IP licensed by Intel (and vice versa).
In any case if the US adrenaline fueled diplomacy, starts violating hundreds of years old borders of it's allies, respect for ambiguous IP Laws, will be pretty low in the list of priorities. :-)
The details have never been disclosed but it is well known that this agreement fell within the domain of national security and export controls.
Here's a press release [1] directly from ASML that references these export controls. Even though this PR actually relaxing DUV controls with respect to the U.S., it reaffirms that "EUV systems are also subject to license requirements."
[1]: https://www.asml.com/en/news/press-releases/2024/dutch-gover...
In return, the consortium would have exclusive rights to the technology in the EUV lithography field of use
Researchers at Lawrence Livermore National Laboratory, Lawrence Berkeley National Laboratory, and Sandia National Laboratories were funded in the 1990s to perform basic research into the technical obstacles. The results of this successful effort were disseminated via a public/private partnership Cooperative R&D Agreement (CRADA) with the invention and rights wholly owned by the US government, but licensed and distributed under approval by DOE and Congress.
https://www.npr.org/2024/11/13/1212604208/asml-euv-extreme-u...
Curious how that happened.
All NatLab-Private partnerships have this kind of a rider.
ASML is already starting another partnership with LLNL on next-gen EUV.
This is false.
> To address the challenge of EUV lithography, researchers at Lawrence Livermore National Laboratory, Lawrence Berkeley National Laboratory, and Sandia National Laboratories were funded in the 1990s to perform basic research into the technical obstacles. The results of this successful effort were disseminated via a public/private partnership Cooperative R&D Agreement (CRADA) with the invention and rights wholly owned by the US government, but licensed and distributed under approval by DOE and Congress.[3] The CRADA consisted of a consortium of private companies and the Labs, manifested as an entity called the Extreme Ultraviolet Limited Liability Company (EUV LLC).[4]
> In 2001 SVG was acquired by ASML, leaving ASML as the sole benefactor of the critical technology.
Unless the situation has changed, the IP is still owned by the US government, and is licensed to ASML through their acquisition of Silicon Valley Group.
"By 2018, ASML succeeded in deploying the intellectual property from the EUV-LLC after several decades of developmental research, with incorporation of European-funded EUCLIDES (Extreme UV Concept Lithography Development System) and long-standing partner German optics manufacturer ZEISS and synchrotron light source supplier Oxford Instruments..."
That explicitly says that the IP is with EUV-LLC (edit: which is of U.S. origin).
"The CRADA consisted of a consortium of private companies and the Labs, manifested as an entity called the Extreme Ultraviolet Limited Liability Company (EUV LLC)."
Again, your first quote explicitly states that EUV-LLC was American. The second quote refers to the "Labs", which in this case were the Lawrence Livermore, Sandia, and Berkeley National Laboratories.
Apple may have developed the M4 from the ground up but they still licensed the ISA from ARM.
"To access EUV technology, Intel in 1997 formed the EUV LLC, which entered into a cooperative R&D agreement (CRADA) with DOE. As part of this agreement, Intel and its partners would pay $250 million over three years to cover the direct salary costs of government researchers at the national labs and acquire equipment and materials for the labs, as well as cover the costs of its own researchers dedicated to the project. In return, the consortium would have exclusive rights to the technology in the EUV lithography field of use. At the time, it was the largest CRADA ever undertaken."
In return, the consortium would have exclusive rights to the technology in the EUV lithography field of use