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A comment on What's Different About Next-Gen Transistors. Parent comment

Re:What's Different About Next-Gen Transistors by JumpCrisscross on Friday October 21, 2022 @03:44PM (#33292256)
> oxide deposition, photoresist, expose, etch process is used for each layer

Would note that since FinFETs, deposition occurs from the side as well as top.

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