Re:Intel: EUV-Enabled 7nm Process Tech is on Track
by baybal2 on Monday December 10, 2018 @04:11AM
(#18646382)
Yes, but they are not gonna be using EUV for every layer. The only way it makes economical sense is where they replace horrific SAQP layers with a single exposure EUV pass, and use conventional litho for the rest to maximise throughput.
They are doing 7FF+ in 2019 with few steps in EUV already. GF and Samsung also have similar schedule. You don't have to trust me. You could look at their investor meeting notes or report from Anandtech.