LOL, no Mention of IMEC(Interuniversity Microelectronics Centre) in the EUV development process and the only reason that the US can restrict the ASML EUV equipment is the EUV Light source and mirror optics for that is partially US produced and the IP there falls under US IP/Export restrictions!

From ASML:

"ASML’s extreme ultraviolet (EUV) light source was developed and is manufactured at its facility in San Diego, California. Acquired from the US firm Cymer in 2013, the R&D team here developed the laser-produced plasma (LPP) system that fires lasers at tin droplets 50,000 times per second to generate EUV light."