Japan has been working on EUV for a long time but is very far from a working machine, despite developing IP. Notice how that article only mentions simulation tests; very very far from getting all the pieces needed for EUV litho.

On the nanoprint technology: as far as I understand it, this will have economic advantages in trailing nodes but is not currently seen as a way to scale past EUV.

They're working on it, but for some time now ASML has been the only game in town