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A comment on EUV Lithography Finally Ready for Chip Manufacturing. Parent comment

Re:EUV Lithography Finally Ready for Chip Manufacturing by posterboy on Monday January 08, 2018 @01:28PM (#16098677)
I have no idea really, but the above explanation implies reminds me on the double slit experiments. Also, inference is additive in the amplitude, but phase shifts much smaller than the wavelengths are used in interferometers to measure layer depths.

https://en.wikipedia.org/wiki/Double-slit_experiment

https://en.wikipedia.org/wiki/List_of_types_of_interferomete...

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Re:EUV Lithography Finally Ready for Chip Manufacturing by dogma1138 on Monday January 08, 2018 @02:47PM (#16099653)
I believe it’s mostly single slit and diffraction, light can pass through holes smaller than its wavelength but even that isn’t needed just yet, nanophotonics will be the next step tho.

http://web.eecs.utk.edu/~jaynewu/Teaching/resolution.pdf

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