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A comment on Moore’s Law Running Out of Room, Tech Looks for a Successor. Parent comment

Re:Moore’s Law Running Out of Room, Tech Looks for a Successor by gene-h on Wednesday May 04, 2016 @02:30PM (#11630526)
Applied Materials presented a roadmap on how we might get to 3 nm using disappointingly conventional semiconductor processing techniques[0]. In short, you make the transistors tall and thin.

[0] https://web.archive.org/web/20130810001315/http://www.semico...

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Re:Moore’s Law Running Out of Room, Tech Looks for a Successor by thoughtsimple on Wednesday May 04, 2016 @03:18PM (#11630933)
Maybe. Most of the presentation is beyond my knowledge level. But the 10nm & 7nm design is showing using a III-V FinFET. As far as I know, no one has that working yet. And as far as I can tell, this doesn't talk much about lithography. Multi patterning is reportedly going to be problem at 10nm and lower and EUV isn't ready yet either.
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