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A comment on Canon Nanoimprint lithography semiconductor manufacturing system (5nm). Parent comment
https://en.wikipedia.org/wiki/Electron-beam_lithography
It can easily make small features, the only issue is low throughput, insufficient for mass production. But it's widely used to make masks.
(however, "5nm" in this case means nothing)
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https://en.wikipedia.org/wiki/Electron-beam_lithography
It can easily make small features, the only issue is low throughput, insufficient for mass production. But it's widely used to make masks.
(however, "5nm" in this case means nothing)