Re:Canon Nanoimprint lithography semiconductor manufacturing...
by mitthrowaway2 on Monday October 16, 2023 @02:51AM
(#37896563)
I think the idea is that you only have to make far fewer masks than wafers, so you can make it slowly. I'm sure it's quite difficult to make, and Canon must have been working to get it right for quite some time.
Good to see they haven't given up in their competition with ASML.
Good to see they haven't given up in their competition with ASML.