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Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by martin_drapeau on Sunday July 30, 2023 @08:21AM (#36930440)
At Imec I recall electron beam lithography was investigated but just too slow. E-beam was analogous to an inkjet printer.
Re:ASML EUV Lithography Machine Could Keep Moore’s Law on Track by Animats on Sunday July 30, 2023 @01:37PM (#36933754)
Whatever happened to Multibeam? [1] They claim to sell a multiple electron beam writer for maskless chip making. They, and their predecessor company, have been at this since 1980. Not much new on the web site, and their last press release was in 2020.

EUV masks are made that way, slowly.

[1] https://multibeamcorp.com/