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Re:EUV Lithography Finally Ready for Chip Manufacturing by anonytrary on Monday January 08, 2018 @07:55AM (#16096368)
Could a subtractive mechanism work? For example, if you want to create a 5nm bump, but you only have a 20nm thick tool to draw bumps, you could draw "everything except the 5nm bump".

In other words, draw a 20nm thick annulus around a 5nm center, thereby having achieved the desired result: drawing a 5nm object with a 20nm tool.

That's a toy example, idk quite how that would translate to photolithography.

Re:EUV Lithography Finally Ready for Chip Manufacturing by josaka on Monday January 08, 2018 @09:46AM (#16097015)
They do something like this with sidewall patterning: https://en.wikipedia.org/wiki/Spacer_patterning
Re:EUV Lithography Finally Ready for Chip Manufacturing by dogma1138 on Monday January 08, 2018 @10:25AM (#16097322)
It’s not a one off etch it’s a series of etchings and depositions of material over the surface until you get the final product.