Re:EUV Lithography Finally Ready for Chip Manufacturing
by josaka on Monday January 08, 2018 @09:46AM
(#16097015)
They do something like this with sidewall patterning: https://en.wikipedia.org/wiki/Spacer_patterning
In other words, draw a 20nm thick annulus around a 5nm center, thereby having achieved the desired result: drawing a 5nm object with a 20nm tool.
That's a toy example, idk quite how that would translate to photolithography.